发明名称 SUCCESSIVE ALIGNER FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a successive aligner for a rectangular substrate capable of switching an irradiated area on the substrate in accordance with the arrangement of an exposed zone on the substrate. SOLUTION: Light from a lamp 1 is made incident on an integrator lens 4 housed in an integrator lens housing part 12 and radiated toward a mask 7 through a reflection mirror 5 and a collimator lens 6, so that the rectangular mask pattern is cast on the surface to be exposed of the substrate (not illustrated). The substrate is moved in XY direction, and respective exposed areas on the substrate are successively exposed. The lens 4 constituted by arranging a plurality of lenses having rectangular cross-sectional shape in parallel is housed in the housing part 12, so that the incident light is shaped to be rectangular. The housing part 12 is equipped with a mechanism to hold the lens 4 turnably by 90 deg. centering the optical axis of the lens 4, and the lens 4 is turned in accordance with the arrangement of the exposed zone on the substrate so as to switch the irradiated area on the substrate.
申请公布号 JP2002131923(A) 申请公布日期 2002.05.09
申请号 JP20000325264 申请日期 2000.10.25
申请人 USHIO INC 发明人 HONMA ATSUSHI
分类号 G02B19/00;G03F7/20;G03F7/22;(IPC1-7):G03F7/20 主分类号 G02B19/00
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