| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for making thin film capable of using an inexpensive metalic target material and forming oxide transparent conductive film at low cost by improving utility efficiency of the target materials. SOLUTION: The oxide transparent conductive film which contains In-O, Sn-O or Zn-O as basic oxides, is formed on a substrate 14 by the reactive sputtering method with using the metalic target material 10 which contains In, Sn or Zn in a vacuum as basic elements. The target material 10 is melted by heating in making film and the sputtering is made with giving a fixed electric field to a liquid state of the target material 10.
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