METHOD FOR DEVELOPING PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To prevent decrease in the yield of products as much as possible and to suppress variation in the line width of photoresist patterns as much as possible. SOLUTION: The method includes repeated processes of applying a developer on an exposed photoresist layer from one end to the other end so as to form a puddle made of the developer on the photoresist layer. At least one process time of forming the puddle in the second or succeeding turns is longer than the process time of forming the first puddle.