发明名称 |
Novel polymers and photoresist compositions for short short wavelength imaging |
摘要 |
This invention relates to resins and photoresist compositions that comprise such resins. This invention includes new resins that comprise photoacid-labile deblocking groups, wherein the acid-labile moiety is substituted with one or more electron-withdrawing groups. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm and sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications resins of the invention exhibit decreased absorbance of short wavelength exposure radiation, such as sub-170 nm radiation e.g. 157 nm.
|
申请公布号 |
US2002055061(A1) |
申请公布日期 |
2002.05.09 |
申请号 |
US20010948525 |
申请日期 |
2001.09.08 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
TAYLOR GARY N.;BRAINARD ROBERT L.;YAMADA SHINTARO |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004;G03F7/26 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|