发明名称 CONTROL APPARATUS FOR PLASMA UTILIZING EQUIPMENT
摘要 PURPOSE: A control apparatus for plasma utilizing equipment is provided in which numerical information items measured by measuring devices can be complementarily and associatively used and the control operation can be accomplished at a high speed with high precision. CONSTITUTION: A control apparatus for plasma utilizing equipment comprises the first, second, and third communication links(11,12,13), a plasma detecting section(18) for detecting a state of plasma generated in a vacuum chamber of the plasma utilizing equipment, a member state detecting section(4) for detecting a state of a member to be processed, a utility detecting section, an energy control device(5), and a utility control device(8) for controlling the utility according to the control information.
申请公布号 KR20020034826(A) 申请公布日期 2002.05.09
申请号 KR20010010470 申请日期 2001.02.28
申请人 HITACHI, LTD. 发明人 ENAMI HIROMICHI;NISHIUMI MASAHARU
分类号 H01L21/3065;H01J37/32;H01L21/00;(IPC1-7):H01L21/306 主分类号 H01L21/3065
代理机构 代理人
主权项
地址