DRESSER FOR POLISHING CLOTH AND ITS MANUFACTURE

摘要

PROBLEM TO BE SOLVED: To provide a CMP polishing dresser having a uniform dressing surface created for the surface of a polishing cloth, a more stable polishing speed and optionally controllable polishing efficiency, while maintaining stable grinding performance. SOLUTION: The operating surface of the polishing cloth dresser is formed by a number of abrasive grains 2 and a plane holding material 3 for holding them. Unit grains of the abrasive grains 2 are arranged on the surface of the holding material in such two-dimensional regular array that a distance between the adjacent abrasive grains in the minimum lattices formed by the array is within 10-3000 μm. The abrasive grains are arrayed in substantially uniform distribution.