发明名称 METHOD AND APPARATUS FOR REGULATING APPLICATION WIDTH IN METHOD FOR EXTRUSION APPLICATION
摘要 PROBLEM TO BE SOLVED: To provide an application method and an application apparatus in which an applicator is not stopped in the coating of a product having various base material widths and application widths by one die nozzle or an application method and an application apparatus which can obtain the uniformity of an application width. SOLUTION: A block 7 for regulating the application width is installed in the tip part liquid bank of a slot 5 which is formed between a front edge 6 and a doctor edge 1, and when a coating liquid is applied on a continuously traveling base material 8, the position of the block is adjusted correspondingly to the change in the application width of each coated product, thus the fine adjustment of the application width during the production of the product to adjust it to a desirable application width is enabled.
申请公布号 JP2002126598(A) 申请公布日期 2002.05.08
申请号 JP20000329440 申请日期 2000.10.27
申请人 RICOH CO LTD 发明人 SHIMIZU TOMOHITO;YAMAMOTO KAZUTADA;ONODA SHIGEO;MURAMATSU SUSUMU;SUZUKI MITSUYOSHI
分类号 B05D1/26;B05B1/04;B05C5/02;B05D7/00;(IPC1-7):B05C5/02 主分类号 B05D1/26
代理机构 代理人
主权项
地址