| 摘要 |
A manufacturing system for providing a device on a wafer, e.g. a semi conductor wafer, comprising a first exposure apparatus 300 for exposing wafer to a light source whilst moving the wafer a predetermined distance, and a second exposure apparatus 100 for exposing the wafer to a plurality of electron beams, the plurality of electron beams having an interval of substantially N or 1/N times the distance the wafer is moved during exposure to the light source by the first exposure apparatus 300, where N is a natural number. There is further disclosure of multi-axis electron lens (Figs. 3 and 4) having a plurality of openings (204) for allowing passage of the plurality of electron beams. |
