| 摘要 |
The invention relates to a vapor deposition coating apparatus. More particularly it relates to an apparatus in which the ion current density is carefully controlled to improve coating. This control enhances the versatility and enlarges the range of deposition conditions which can be achieved within a single apparatus, so that coatings with very different properties can be deposited in the same equipment. The vapor deposition apparatus includes a vacuum chamber, at least one coating means or ionization source disposed at or about the periphery of a coating zone, one or more internal magnetic means positioned such that the magnetic field lines are generated across the coating zone and means for altering the strength or position of the magnetic field lines to aid confinement.
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