| 摘要 |
Provided is a coating film forming apparatus capable of shortening an operating time without considerably altering the design of the apparatus and changing the physical properties of a material such as a resist solvent. A spin coater for spreading a coating solution 5 dropped onto a substrate 1 to be coated over the substrate 1 to be coated by the centrifugal pump action performed with the rotation of the substrate 1 to be coated and for evaporating a solvent in the coating solution 5 to form a coating film on the substrate 1 to be coated, a tank 14 for storing the coating solution, and a housing case 15 for accommodating the substrate to be coated are provided in a casing P, and the casing P is provided in a cleaning room. A temperature in the casing P is set higher than a temperature in the clean room on the outside of the casing P by using temperature control devices 30, 31, 32 and 33. Consequently, an operating time can be shortened.
|
