发明名称 Partitioned mask layout
摘要 In connection with the manufacture of chips having partitioned logic, a partitioned mask layout approach. This approach provides the chip exposure pattern as a set of partitions corresponding to macros or core functions and also handles glue logic and interconnect. A result of this approach is a simplified, cost-effective process that does not defer customization to other, potentially more time-consuming and inefficient tasks.
申请公布号 US6383847(B1) 申请公布日期 2002.05.07
申请号 US20000699895 申请日期 2000.10.30
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DITLOW GARY S.;HENG FOOK-LUEN;LAVIN MARK A.;OSTAPKO DANIEL L.;YOON JUNG H.
分类号 G03F1/14;H01L21/82;(IPC1-7):H01L21/82 主分类号 G03F1/14
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