发明名称 Protective member for inner surface of chamber and plasma processing apparatus
摘要 An inner wall protection member used to protect the inner wall of a chamber of a plasma treatment apparatus which can be used stably for a long period of time by specifying properties of glass-like carbon materials, and a plasma treatment apparatus provided with the protection member. The hollow protection member for protecting the inner wall of a plasma processing chamber is integrally formed of glass-like carbon materials with a volume resistivity of 1x10-2 OMEGA.cm or less and a thermal conductivity of 5 W/m.K or more. The protection member preferably has a thickness of 4 mm or more and the average surface roughness (Ra) of the inside of the hollow structure is preferably 2.0 mum or less. The plasma processing apparatus is configured so that the inner wall protection member having the above characteristics is arranged along the inner wall of the chamber of the plasma processing apparatus, wherein the inner wall of the chamber and the protection member are electrically connected and the chamber is grounded.
申请公布号 US6383333(B1) 申请公布日期 2002.05.07
申请号 US20000673985 申请日期 2000.10.23
申请人 TOKAI CARBON COMPANY, LTD.;TOKYO ELECTRON LTD. 发明人 HAINO KAZUYOSHI;KAZAMA KOICHI
分类号 H05H1/46;C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23F1/02 主分类号 H05H1/46
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