发明名称 Semiconductor integrated circuit device
摘要 In a semiconductor integrated circuit in which an internal voltage generation circuit operating on a power supply voltage supplied through an external terminal forms either or both of a low voltage and a boosted voltage to operate internal circuits, a first internal circuit operating on the power supply voltage supplied through the external terminal or the boosted voltage formed by the internal voltage generation circuit is constituted by a first MOSFET with a gate insulation film having a large thickness adapted to the power supply voltage or boosted voltage, and a second internal circuit operating on the low voltage is constituted by a second MOSFET with a gate insulation film having a small thickness adapted to the low voltage.
申请公布号 US6385118(B2) 申请公布日期 2002.05.07
申请号 US20010907929 申请日期 2001.07.19
申请人 HITACHI, LTD.;HITACHI DEVICE ENGINEERING CO., LTD. 发明人 FUJISAWA HIROKI;KAJIGAYA KAZUHIKO;FUKUI KENICHI;TACHIBANA TOSHIKAZU
分类号 H01L21/8242;G11C5/14;G11C11/407;H01L27/108;(IPC1-7):G11C7/00 主分类号 H01L21/8242
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