| 摘要 |
PURPOSE: An apparatus for sensing whether a photoresist is coated or not on a semiconductor wafer is provided to prevent process failure due to non-coating of the photoresist. CONSTITUTION: A photoresist coating unit(10) controls a coating action of the photoresist, generates a signal for coating, and stops the coating action by receiving an interlock signal. A nozzle(12) is connected to the coating unit(10) via a pipe and supplies the photoresist by a control of the coating unit(10). When the nozzle(12) is not in the coating action, the nozzle(12) is located in a nozzle waiting room(14). An optical fiber sensor(18) is formed near a lower part of the waiting room(14) so as to detect the coating state of the photoresist from the nozzle(12). In addition, a signal comparator(20) generates the interlock signal after comparing a signal of the coating state detected from the sensor(18) with the coating signal generated from the coating unit(10).
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