发明名称 PHOTO-CURED DENTAL PIT AND FISSURE SEALANT COMPOSITIONS FOR CARIES PREVENTION
摘要 PURPOSE: Provided is a photo-cured dental pit and fissure sealant composition for caries prevention which shows excellent physical and mechanical properties and bio-adaptability . CONSTITUTION: The photo-cured dental pit and fissure sealant composition for caries prevention comprises: 15-80 wt.% of a pre polymer mixture of 2,2-bis-(4-(2-hydroxy-3-methacryloyloxypropoxy)phenyl)propane("Bis-GMA") of the formula(1) and Tri-GMA in a weight ratio of 95:5-5:95; 5-50 wt.% of diluents; 1-40 wt.% of inorganic fillings; photoinitiators; and additives.
申请公布号 KR20020032658(A) 申请公布日期 2002.05.04
申请号 KR20000062825 申请日期 2000.10.25
申请人 DENTKIST CO., LTD.;KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 AHN, GWANG DEOK;HAN, DONG GEUN;JUNG, JIN HUI
分类号 A61C13/00;A61K6/08;A61K6/083;C08F2/46;C08K5/08;C08K5/17;C08L33/06;C09D4/00;(IPC1-7):A61K6/08 主分类号 A61C13/00
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