| 摘要 |
PURPOSE: A power supply and a power supplying method are provided to achieve a superior property of the thin film by controlling the output of the power supply for generating and controlling the plasma in a micro second. CONSTITUTION: A power supply, which allows the output of the power supply for generating and controlling the plasma to change according to the micro second, comprises a DC power source unit group including one or more DC power source unit, a DC power source unit selection switch elements group including switch elements connected to the DC power source units respectively so as to select one DC power source unit of the DC power source unit group, a controller for controlling the DC power source unit group and the switch elements, and a microprocessor storing the program for operating the controller.
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