DE-COUPLED WAFER LIFT AND FIVE AXIS ADJUSTABLE HEATER LIFT SYSTEM FOR CVD PROCESS CHAMBER

摘要

PURPOSE: An implementation of decoupled wafer lift and heater lift mechanism for use in chemical vapor deposition process chambers are provided. CONSTITUTION: The de-coupled lift system comprises a heater lift and a wafer lift. The heater lift is composed of two mating components: a clamping block and a yoke. The clamping block is a monolithic structure with a clamping flexure arm integrated into the structure's body. The clamping block provides a horizontal gravitationally referenced clamping surface. The yoke provides a similar horizontal gravitationally referenced clamping surface as the clamping block. The yoke utilizes clamping components mated to the main yoke body by clamping screws. The yoke is inserted into the clamping block through the clamping block's flexure arm. The wafer lift contains a keyed lift hoop, lift pins oriented substantially perpendicular to the hoop, and a keyed bellows shaft. The keyed lift hoop and keyed bellows shaft are coupled by a single set of clamping screws. The lift pins are oriented vertically and guided by sleeves in the heater body and move up and down by contacting the horizontal surface of the hoop.