| 摘要 |
PURPOSE: To provide a composition for polishing pads, containing a substance having a specified functional group superior in hydrophilic properties, etc., and a polishing pad which has a superior water resistance and durability and a superior polishing performance with high polishing rate, etc. CONSTITUTION: Materials (a) 1,2-polybutadiene 99 mass %, (b) both-terminal hydroxyl group-containing polybutadiene 1 mass %, andβ-cyclodextrine (water- soluble substance) 30 volume % of the sum of (a) and (b) are kneaded by a kneader heated at 120°C. One mass part of an organic peroxide is added to total 100 mass parts of (a) and (b), and they are kneaded and cross-linked in a die, at 170°C for 15 min, to form a polishing pad of 60 cm diameter and 2 mm thickness. |
