Minimization of electron fogging in electron beam lithography,申请号EP20000960201-传众专利搜索

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发明名称	Minimization of electron fogging in electron beam lithography
摘要
申请公布号	EP1200979(A1)	申请公布日期	2002.05.02
申请号	EP20000960201	申请日期	2000.07.28
申请人	APPLIED MATERIALS, INC.	发明人	INNES, ROBERT;VENEKLASEN, LEE, H.;SAGLE, ALLAN, L.;BABIN, SERGEY, V.;HWA, CHEN
分类号	G03F7/20;G01Q70/10;H01J37/09;H01J37/305;H01L21/027;(IPC1-7):H01J37/09	主分类号	G03F7/20
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