Ultraviolet lamp system and methods

摘要

An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A pair of reflectors are mounted within the processing space of the microwave chamber. The reflectors are capable of reflecting a significant portion of the ultraviolet radiation to irradiate the backside of the substrate in a surrounding and uniform fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.