| 摘要 |
<p>A UV laser beam is used to machine semiconductor. The beam intensity (IB) is chosen so that it lies in a range of such values for which there is an increasing (preferably linear) material removal rate for increasing IB. An elongate formation such as a trough or a slot is machined in n scans laterally offset (0- centre), for each value of z-integer in the z direction.</p> |
