发明名称 |
TREATED SUBSTRATE TRANSFER SYSTEM IN SEMICONDUCTOR TREATMENT EQUIPMENT |
摘要 |
A treated substrate (W) transfer system in a semiconductor treatment equipment (2), comprising guide rails (42) disposed in a common transfer area (6) for transferring the treated substrate (W) between a plurality of semiconductor treatment devices (8A to 8F), a mobile body (44A) movably disposed along the guide rails (42), and a first support part (78) for supporting the treated substrate (W) disposed on the mobile body (44A), having an engagement step part (82) of L-shape in cross section for placing the edge of the treated substrate (W) thereon, and having one or a plurality of cut-out parts (81) for a plurality of handling arm devices (100 to 112) handling the treated substrate to gain access thereto.
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申请公布号 |
WO0235604(A1) |
申请公布日期 |
2002.05.02 |
申请号 |
WO2001JP09246 |
申请日期 |
2001.10.22 |
申请人 |
TOKYO ELECTRON LIMITED;SHINKO ELECTRIC CO., LTD.;MASUOKA, NOBORU |
发明人 |
MASUOKA, NOBORU |
分类号 |
B65G49/07;B65G54/02;H01L21/304;H01L21/677;(IPC1-7):H01L21/68;H02J17/00;H04B10/00 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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