发明名称 TREATED SUBSTRATE TRANSFER SYSTEM IN SEMICONDUCTOR TREATMENT EQUIPMENT
摘要 A treated substrate (W) transfer system in a semiconductor treatment equipment (2), comprising guide rails (42) disposed in a common transfer area (6) for transferring the treated substrate (W) between a plurality of semiconductor treatment devices (8A to 8F), a mobile body (44A) movably disposed along the guide rails (42), and a first support part (78) for supporting the treated substrate (W) disposed on the mobile body (44A), having an engagement step part (82) of L-shape in cross section for placing the edge of the treated substrate (W) thereon, and having one or a plurality of cut-out parts (81) for a plurality of handling arm devices (100 to 112) handling the treated substrate to gain access thereto.
申请公布号 WO0235604(A1) 申请公布日期 2002.05.02
申请号 WO2001JP09246 申请日期 2001.10.22
申请人 TOKYO ELECTRON LIMITED;SHINKO ELECTRIC CO., LTD.;MASUOKA, NOBORU 发明人 MASUOKA, NOBORU
分类号 B65G49/07;B65G54/02;H01L21/304;H01L21/677;(IPC1-7):H01L21/68;H02J17/00;H04B10/00 主分类号 B65G49/07
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