发明名称 METHOD FOR MONITORING A PRODUCTION PROCESS FOR PREPARING A SUBSTRATE IN SEMICONDUCTOR MANUFACTURING
摘要 <p>The invention relates to a method for monitoring a production process, whereby several models are used for detecting a finish point. The results of the model are subsequently compared with one another and the best model therefrom is used in other production processes to detect a finish point. The inventive method provides the advantage that process changes resulting from chamber contaminations or sensor drift are compensated for by selecting the best model, thereby ensuring reliable finish point detection even in case of unfavorable process conditions.</p>
申请公布号 EP1200982(A1) 申请公布日期 2002.05.02
申请号 EP19990952378 申请日期 1999.08.12
申请人 INFINEON TECHNOLOGIES AG 发明人 BELL, FERDINAND
分类号 H01L21/66;(IPC1-7):H01J37/32 主分类号 H01L21/66
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