| 发明名称 |
Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 摘要 |
The reliability of a photomask is improved. The planar shape of a mask substrate 1 of a resist shading mask having a shading pattern composed of a resist film is made circular. |
| 申请公布号 |
US2002052088(A1) |
申请公布日期 |
2002.05.02 |
| 申请号 |
US20010943499 |
申请日期 |
2001.08.31 |
| 申请人 |
OKAMOTO YOSHIHIKO;KOBAYASHI MASAMICHI;MOMOSE SATOSHI |
发明人 |
OKAMOTO YOSHIHIKO;KOBAYASHI MASAMICHI;MOMOSE SATOSHI |
| 分类号 |
G03F1/08;G03F1/00;G03F1/10;G03F1/14;G03F1/32;G03F1/56;G03F1/60;G03F1/68;G03F1/72;G03F1/76;G03F1/80;G03F1/82;G03F1/84;G03F7/20;G03F9/00;H01L21/027;H01L21/768;H01L21/8238;(IPC1-7):H01L21/331 |
主分类号 |
G03F1/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
