SILICIDE TARGET FOR DEPOSITING LESS EMBRITTLING GATE OXIDE AND METHOD OF MANUFACTURING SILICIDE TARGET,申请号KR1020027001565-传众专利搜索

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发明名称	SILICIDE TARGET FOR DEPOSITING LESS EMBRITTLING GATE OXIDE AND METHOD OF MANUFACTURING SILICIDE TARGET
摘要
申请公布号	KR20020031403(A)	申请公布日期	2002.05.01
申请号	KR1020027001565	申请日期	2002.02.05
申请人		发明人
分类号	H01L21/203	主分类号	H01L21/203
代理机构		代理人
主权项
地址

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