| 摘要 |
PURPOSE: Disclosed are an apparatus and a method for vaporizing and delivering liquid precursor to a processing chamber. CONSTITUTION: A liquid delivery system(100) comprises an internal gas pressuring system to transfer precursor material therein. The liquid delivery system(100) generally provides a liquid precursor to a vaporizer, vaporizes the liquid precursor, and then delivers the vaporized precursor to a processing chamber which dissociates or reacts the vaporized precursor to deposit a film of a substrate surface. The liquid delivery system(100) includes a source of liquid precursor(120), a vaporization assembly(130), and a processing chamber(160) along a flow path(110). The vaporization assembly(130) includes an ampoule and a mass flow controller(150). The flow path(110) includes a fluid line(125) disposed between the liquid supply(120) and ampoule, a fluid line(145) disposed between the ampoule and the mass flow controller(150), fluid lines(155,115) disposed between the mass flow controller(150) and the processing chamber(160), and a fluid line(200) located between the mass flow controller(150) and a pump assembly.
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