| 摘要 |
A method of removing regions of an anti-reflective coating includes etching the anti-reflective coating with a fluorinated hydrocarbon-based plasma etch and etching the anti-reflective coating with an oxygen-based plasma etch. In some implementations, the oxygen-based plasma etch is performed following the fluorinated hydrocarbon-based etch. The technique can be used to remove regions of an anti-reflective coating so that a more uniform and controlled etch of an underlayer can subsequently be performed. The disclosed technique is particularly useful for etching organic or organometallic anti-reflective layers, but can be used to etch other anti-reflective layers as well. In addition, the techniques are particularly advantageous for etching anti-reflective coatings disposed on certain oxide and nitride layers, although the underlayer can be formed of other materials as well.
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