发明名称 Electrically programmable photolithography mask
摘要 An electronically programmed mask is connected to an electronic device, such as a processor. In operation, a mask design is first entered into the processor. The processor controls a display of an image on the electronically programmed mask, wherein the display replicates conventional type masks. The electronically programmed mask is designed such that the display presented on its screen provides optical contrast and characteristics that are easily changed or reprogrammed by the processor. Electronically controlled masks provide the same patterns as mechanical type masks without requiring rigid, permanent type structures to form a desired pattern.
申请公布号 US6379847(B2) 申请公布日期 2002.04.30
申请号 US19990426386 申请日期 1999.10.25
申请人 MICRON TECHNOLOGY, INC. 发明人 CUTTER DOUGLAS J.;PIERRAT CHRISTOPHE
分类号 G03F1/00;G03F1/14;G03F7/20;(IPC1-7):G03F9/00;G06F3/00 主分类号 G03F1/00
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