| 摘要 |
A process and device are provided for controlling a gap between a mask and a workpiece in a proximity exposure device in which there are only a few processes of measurement of the exposure gap and parallel adjustment, in which even for a large workpiece the gap between the mask and the workpiece can be controlled without contact of the workpiece with the mask, and in which no special skill is needed to adjust the gap. The process and device includes moving a workpiece carrier composed of a first movement device and a second movement device, the latter being located on a carrier driven by the first movement device and consisting of several workpiece carrier support parts which move the workpiece carrier up and down and control its slope. The size of the gap between the bottom of a mask and the top of a workpiece located on the workpiece carrier is measured at several locations. Based on the size of the gap, the positions of the workpiece carrier support parts, when the several workpiece carrier support parts move, are recorded as a parallel zero point in a control element. The motion of the workpiece carrier support parts is executed such that the workpiece carrier is located parallel to the mask. When starting to use the device, the workpiece carrier support parts are each in a standby state after they have been moved to the parallel zero points recorded in the control element. When the workpiece is being exposed, it is placed on, and held securely to, the workpiece carrier and raised by means of the first movement device until the alignment gap position is reached.
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