发明名称 |
Micro structure and its manufacture method |
摘要 |
A laminated substrate is prepared, the laminated substrate having two layers including a first film and a second film in tight contact with the first film, the second film being made of a material capable of being etched with synchrotron radiation light. A mask member with a pattern is disposed in tight contact with the surface of the second film of the laminated structure or at a distance from the surface of the second film, the pattern of the mask member being made of a material not transmitting the synchrotron radiation light. The synchrotron radiation light is applied on a partial surface area of the second film via the mask member to etch the second film where the synchrotron radiation light is applied and to expose a partial surface area of the first film on the bottom of an etched area.
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申请公布号 |
US6379773(B1) |
申请公布日期 |
2002.04.30 |
申请号 |
US20000602274 |
申请日期 |
2000.06.23 |
申请人 |
SUMITOMO HEAVY INDUSTRIES, LTD. |
发明人 |
KATOH TAKANORI;ZHANG YANPING |
分类号 |
B32B3/02;B32B27/06;B81C1/00;G03F7/00;G03F7/075;G03F7/09;G03F7/20;(IPC1-7):B32B3/24 |
主分类号 |
B32B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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