| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition excellent in sensitivity, resolving power, resistance to a developing solution, sandblast resistance, etc., and useful also in a dry film resist by using a specified carboxyl-containing urethane-acrylic resin. SOLUTION: The photosensitive resin composition comprises a carboxyl- containing urethane-acrylic resin of formula I, a photopolymerization initiator and an acrylic polymer containing a hydroxyl-containing functional monomer in a copolymerization ratio of >=50 wt.% and having <=50 mgKOH/g acid value. In the formula, R1 is the urethane bond residue of a compound having one or more ethylenically unsaturated group and one hydroxyl group, R2 is the double end urethane bond residue of a polyisocyanate compound, R3 is the double end urethane bond residue of a carboxyl-containing polyol, R4 is the double end urethane bond residue of a polyol or a polyester polyol having an average molecular weight of >=500, X is a structure of formula II, Y is a structure of formula III, Z is a structure of formula IV, (l) and (n) are each 0 or 1 and (m) is an integer of 1-20. |
