Thin film forming method and apparatus

摘要

A method and an apparatus for forming a thin film are provided to achieve precise control of a film thickness. In a thin film forming apparatus a shutter provided between a target and a substrate is rotated a plurality of times during a film forming process so that a slit of the shutter passes between the target and the substrate a plurality of times. A thin film forming substance thereby arrives at the substrate from the target a plurality of times in an intermittent manner. A thin film having a predetermined thickness is thus formed on the substrate.