发明名称 Method for reducing particle concentration within a semiconductor device fabrication tool
摘要 A method is provided for reducing the number of particles within a chamber of a fabrication tool located within a gray area of a clean room. A portable clean room station is provided that is capable of producing a white environment having fewer particles than the gray environment. The portable clean room station is positioned so that the chamber is exposed to the white environment of the portable clean room station rather than to the gray environment when the chamber is opened within the gray area. The white environment, which has fewer particles than the gray environment, is produced by employing the portable clean room station, and the chamber is then opened. Thereafter maintenance is performed on the opened chamber. Preferably the white environment is selected so as to have at least two orders of magnitude fewer particles per cubic foot than the gray environment.
申请公布号 US6379428(B1) 申请公布日期 2002.04.30
申请号 US20000501697 申请日期 2000.02.10
申请人 APPLIED MATERIALS, INC. 发明人 MOSTOVOY ROMAN;MORI GLEN T.
分类号 B03C3/82;B08B15/02;H01L21/00;(IPC1-7):B03C3/82 主分类号 B03C3/82
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