PREPARATION METHOD AND APPARATUS FOR SEMICONDUCTOR SAMPLE

摘要

PROBLEM TO BE SOLVED: To realize highly sensitive element analysis of impurities of a semiconductor material with a PIXE. SOLUTION: The semiconductor material 20 is made to react with an etching liquid 22 containing hydrofluoric nitrate. The recovered etching liquid 28 is evaporated to the dryness and base material elements are evaporated to be removed thereby making a PIXE sample.