发明名称 SEM-TYPE DEFECT-REVIEWING DEVICE AND METHOD AND INSPECTION SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide an SEM-type defect-reviewing device that automatically classifies defects in continuity fail such as discontinuity and short-circuiting generated in conductor components such as a contact hole buried in a substrate to be inspected such as a semiconductor wafer to categories correlating closely with the causes of the defect. SOLUTION: Potential contrast defects are classified according to the arrangement state of the defect holes, or are classified based on the correlation with a component position in a preprocess by referring to design information. In addition, the cause of defect is estimated.</p>
申请公布号 JP2002124555(A) 申请公布日期 2002.04.26
申请号 JP20000316334 申请日期 2000.10.17
申请人 HITACHI LTD 发明人 OKUDA HIROTO;TAKAGI YUJI;SHIBUYA HISAE;NAKAGAKI AKIRA;KUROSAKI TOSHISHIGE;OBARA KENJI
分类号 G01N23/225;H01J37/22;H01J37/28;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N23/225
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