发明名称 |
SEM-TYPE DEFECT-REVIEWING DEVICE AND METHOD AND INSPECTION SYSTEM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an SEM-type defect-reviewing device that automatically classifies defects in continuity fail such as discontinuity and short-circuiting generated in conductor components such as a contact hole buried in a substrate to be inspected such as a semiconductor wafer to categories correlating closely with the causes of the defect. SOLUTION: Potential contrast defects are classified according to the arrangement state of the defect holes, or are classified based on the correlation with a component position in a preprocess by referring to design information. In addition, the cause of defect is estimated.</p> |
申请公布号 |
JP2002124555(A) |
申请公布日期 |
2002.04.26 |
申请号 |
JP20000316334 |
申请日期 |
2000.10.17 |
申请人 |
HITACHI LTD |
发明人 |
OKUDA HIROTO;TAKAGI YUJI;SHIBUYA HISAE;NAKAGAKI AKIRA;KUROSAKI TOSHISHIGE;OBARA KENJI |
分类号 |
G01N23/225;H01J37/22;H01J37/28;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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