发明名称 |
WAFER HOLDING JIG, WAFER HOLDER AND HEAT TREATING FURNACE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a low-cost wafer holding jig, a wafer holder and a heat treating furnace which sufficiently suppresses slip generation in a high temperature heat treatment of silicon wafers, without deteriorating the productivity. SOLUTION: The wafer holding jig is a plat-like holding jig for mounting a wafer on the upside, comprising three or more wafer receiving members having wafer supports on the jig, and at least one of the receiving members has a plurality of projective wafer supports on the upside and is composed of a movable receiving member having a movable structure relative to the holding jig so that the wafer is supported with at least four wafer supports. The holder and the heat treating furnace incorporate a plurality of the wafer holding jigs each.</p> |
申请公布号 |
JP2002124519(A) |
申请公布日期 |
2002.04.26 |
申请号 |
JP20000315553 |
申请日期 |
2000.10.16 |
申请人 |
NIPPON STEEL CORP |
发明人 |
KAWAMURA KEISUKE;SASAKI TSUTOMU;MATSUMURA ATSUKI;IKARI ATSUSHI |
分类号 |
H01L21/683;H01L21/02;H01L21/22;H01L21/324;H01L21/68;H01L27/12;(IPC1-7):H01L21/324 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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