发明名称 WAFER HOLDING JIG, WAFER HOLDER AND HEAT TREATING FURNACE
摘要 <p>PROBLEM TO BE SOLVED: To provide a low-cost wafer holding jig, a wafer holder and a heat treating furnace which sufficiently suppresses slip generation in a high temperature heat treatment of silicon wafers, without deteriorating the productivity. SOLUTION: The wafer holding jig is a plat-like holding jig for mounting a wafer on the upside, comprising three or more wafer receiving members having wafer supports on the jig, and at least one of the receiving members has a plurality of projective wafer supports on the upside and is composed of a movable receiving member having a movable structure relative to the holding jig so that the wafer is supported with at least four wafer supports. The holder and the heat treating furnace incorporate a plurality of the wafer holding jigs each.</p>
申请公布号 JP2002124519(A) 申请公布日期 2002.04.26
申请号 JP20000315553 申请日期 2000.10.16
申请人 NIPPON STEEL CORP 发明人 KAWAMURA KEISUKE;SASAKI TSUTOMU;MATSUMURA ATSUKI;IKARI ATSUSHI
分类号 H01L21/683;H01L21/02;H01L21/22;H01L21/324;H01L21/68;H01L27/12;(IPC1-7):H01L21/324 主分类号 H01L21/683
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