发明名称 METHOD AND SYSTEM FOR FORMING DEPOSIT FILM BY MICROWAVE PLASMA CVD
摘要 PROBLEM TO BE SOLVED: To provide a microwave plasma CVD system by which microwave transmission efficiency can be improved and the failure of a microwave introducing window by heat and film deposition on it can be prevented and, further, conversion into microwaves having uniform wave crests can be attained and large-diameter plasma can be produced. SOLUTION: A plasma control means having a plurality of partition plates integrally in the advancing direction of microwaves is provided to the inside of a vacuum treatment chamber having a microwave introducing window. The partition plates are arranged so that the spaces between them become narrower with the approach to both ends of their array in a direction orthogonal to the advancing direction of microwaves. In a state where the partition plates are brought into close contact with the microwave introducing window, microwaves are introduced into the vacuum treatment chamber via the plasma control means. In this way, microwave plasma is generated in the vacuum treatment chamber. Further, the system having such partition plates and plasma control means is provided.
申请公布号 JP2002121671(A) 申请公布日期 2002.04.26
申请号 JP20000313888 申请日期 2000.10.13
申请人 CANON INC 发明人 TAKATSU KAZUMASA;KANAI MASAHIRO
分类号 H05H1/46;C23C16/44;H01L21/205 主分类号 H05H1/46
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