HIGH QUALITY LITHOGRAPHY METHOD

摘要

PROBLEM TO BE SOLVED: To improve a stitching error and surface roughness. SOLUTION: Lithographic processing utilized in the manufacture of a micromachine is troubled to far by a stitching error and an error caused from the surface roughness of a photosensitive material. These errors can be minimized by minimizing the stitching error by a multipass exposure technique. The error due to the surface roughness is minimized by subjecting the surface of the photosensitive material to temperature treatment in such a way that the major part of the photosensitive material is not disturbed.