| 摘要 |
PROBLEM TO BE SOLVED: To provide etching equipment which is capable of uniformizing the treatment over a fine pattern part and reducing the damage and superior in productivity. SOLUTION: A high frequency power pulse compressor for compressing pulses converted from a high frequency power waveform in high frequency discharge, a plasma generator for generating a plasma using a high frequency power pulse-compressed by the pulse compressor, and a discharge electrode for etching with the plasma generated by the plasma generator.
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