发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To enable containing of a decoupling capacitor, having a large capacity by reducing a power source noise of an LSI which has high drive frequency in a semiconductor device, having an integrated circuit and the decoupling capacitor. SOLUTION: The semiconductor device comprises a first insulating film 7 formed on a semiconductor element 6, a multilayer interconnection structure having a first power source wiring 13a, a second power source wiring 13b and a signal wiring 13d formed on the film 7, a second insulating film 14 formed on the multilayer structure, a first electrode 16 of the decoupling capacitor 19 electrically connected to the wiring 13a formed on the film 14, a first dielectric film 17 of the capacitor 19 formed on the electrode 16, and a second electrode 18 of the capacitor 19 electrically connected to the wiring 13b formed on the film 17.
申请公布号 JP2002124636(A) 申请公布日期 2002.04.26
申请号 JP20000315682 申请日期 2000.10.16
申请人 FUJITSU LTD 发明人 KURIHARA KAZUAKI;IMANAKA YOSHIHIKO;NISHIZAWA MOTOTOSHI;OKAMOTO KEISHIRO;MARUYAMA KENJI;YAMAWAKI HIDEKI;UMEMIYA SHIGEYOSHI;KURASAWA MASAKI
分类号 H01L23/52;H01L21/3205;H01L21/822;H01L27/04;(IPC1-7):H01L27/04;H01L21/320 主分类号 H01L23/52
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