| 摘要 |
PROBLEM TO BE SOLVED: To continuously manufacture a transparent conductive film having a transparent conductive thin film on a transparent substrate made of a plastic film at a high speed and stably for a long period by a reactive sputtering film deposition method using a metal target. SOLUTION: In the manufacturing method of the transparent conductive film by which the transparent conductive thin film is formed by simultaneously discharging plural sputtering cathodes 9 arranged oppositely to the transparent substrate 10 made of the plastic film while transferring the substrate 10, and reactively sputtering metal targets 8 attached to respective cathodes on the substrate, plasma light emission intensities of respective cathodes are measured to control reactive gas flow rates of respective cathodes so as to be equal to setting values, further, optical characteristics of the transparent conductive thin film deposited between respective cathodes just before now are measured based on this measurement to control the setting value of the plasma light emission intensity of the adjacent cathode.
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