发明名称 SEMICONDUCTOR LASER ELEMENT
摘要 PROBLEM TO BE SOLVED: To improve the temperature dependence of threshold current in a semiconductor laser element. SOLUTION: On an N-GaAs substrata 11, an n-In0.49Ga0.51P clad layer 12, an n- or i-Inx2Ga1-x2As1-y2Py2 optical waveguide layer 13, a compressively strained Inx3Ga1-x3As1-y3Py3 quantum well active layer 14, a p- or i-Inx2Ga1-x2 As1-y2Py2 upper first optical waveguide layer 15, a p-Inx9Ga1-x9P first etching stopping layer 16, a p-Inx1Ga1-x1As1-y1Py1 second etching stopping layer 17, an n-In0.49Ga0.51P current constriction layer 18, and an n-GaAs cap layer 19 are stacked. The GaAs cap layer 19 and the n-In0.49Ga0.51P current constriction layer 18 on a stripe region are etched with an SiO2 film 20 serving as a mask. Subsequently, the n-GaAs cap layer 19 and the p-Inx1Ga1-x1As1-y1Py1 second etching stopping layer 17 on the bottom of a groove are removed. A p-Alz2Ga1-z2 As upper second optical waveguide layer 21, a p-In0.49Ga0.51P clad layer 22, and a p-GaAs contact layer 23 are formed thereon.
申请公布号 JP2002124739(A) 申请公布日期 2002.04.26
申请号 JP20000317650 申请日期 2000.10.18
申请人 FUJI PHOTO FILM CO LTD 发明人 FUKUNAGA TOSHIAKI
分类号 H01S5/343;H01S5/22;H01S5/223;H01S5/34;(IPC1-7):H01S5/343 主分类号 H01S5/343
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