METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND METHOD FOR MANUFACTURING PHOTO MASK

摘要

PROBLEM TO BE SOLVED: To shorten a period for manufacturing a photo mask having a shading pattern formed of an organic film. SOLUTION: An area D2 for manufacturing the photo mask having the shading pattern formed of the organic film and areas D3-D9 for manufacturing the semiconductor integrated circuit device are arranged in the same clean room D1, and the manufacturing devices and inspection devices are shared when the photo mask and the semiconductor integrated circuit device are manufactured.