发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE DRY FILM, MATERIAL OBTAINED BY USING THE COMPOSITION AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition having superior storage stability and photosensitivity, and to provide a negative type photosensitive dry film, a material obtained using the composition and a pattern forming method. SOLUTION: The negative photosensitive resin composition contains (A) a photo-curable resin having a photosensitive group crosslinkable by irradiation with light, (B) a photo-acid generating agent and (C) a benzopyran ring condensed compound having photosensitizing capacity to visible light of >=500 nm wavelength.
申请公布号 JP2002122987(A) 申请公布日期 2002.04.26
申请号 JP20000315647 申请日期 2000.10.16
申请人 KANSAI PAINT CO LTD 发明人 IMAI GENJI
分类号 C08F2/50;C08K5/00;C08K5/3447;C08K5/42;C08L101/02;G03F7/004;G03F7/038;G03F7/34 主分类号 C08F2/50
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