发明名称 |
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE DRY FILM, MATERIAL OBTAINED BY USING THE COMPOSITION AND PATTERN FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition having superior storage stability and photosensitivity, and to provide a negative type photosensitive dry film, a material obtained using the composition and a pattern forming method. SOLUTION: The negative photosensitive resin composition contains (A) a photo-curable resin having a photosensitive group crosslinkable by irradiation with light, (B) a photo-acid generating agent and (C) a benzopyran ring condensed compound having photosensitizing capacity to visible light of >=500 nm wavelength. |
申请公布号 |
JP2002122987(A) |
申请公布日期 |
2002.04.26 |
申请号 |
JP20000315647 |
申请日期 |
2000.10.16 |
申请人 |
KANSAI PAINT CO LTD |
发明人 |
IMAI GENJI |
分类号 |
C08F2/50;C08K5/00;C08K5/3447;C08K5/42;C08L101/02;G03F7/004;G03F7/038;G03F7/34 |
主分类号 |
C08F2/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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