| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD film forming apparatus capable of removing by- products stuck/deposited to a substrate holding member and regenerating the member for reuse, further, in particular easily cleaning the member without dismounting it deposited with by-products and suppressing an adverse influence for other members in a reaction treatment chamber in cleaning treatment. SOLUTION: In the CVD film forming apparatus to conduct film forming for a substrate-to-be-treated held to the substrate holding members 10, 12, 13 in a reaction treatment chamber, by using a heating means 15 for film forming to heat a raw material gas introduced into the reaction chamber and the substrate-to-be-treated, a lower casing demarcating the reaction treatment chamber is freely mounted/dismounted, a casing 17 for cleaning to be freely mounted/ dismounted is arranged to the section where the lower casing is removed, and a heating means 19 for cleaning, which sublimates/removes a deposited by- product by heating the substrate holding members 10, 12, 13, is arranged to the casing 17 for cleaning.
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