发明名称 |
Method of increasing the conductivity of a transparent conductive layer |
摘要 |
A method of increasing the conductivity of a transparent conductive layer, in which a photoresist layer which patterns the transparent layer is given tapered edges and is partially etched. The partial etching exposing the edge regions of the underlying transparent conductor layer, which are the selectively plated. This method has a single patterning stage of the transparent layer, but uses partial etching of a tapered resist layer in order to expose a small edge region of the transparent layer for coating with a conductive layer (which can be opaque).
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申请公布号 |
US2002048834(A1) |
申请公布日期 |
2002.04.25 |
申请号 |
US20010998031 |
申请日期 |
2001.11.29 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
FRENCH IAN D.;VAN DER ZAAG PIETER J.;MEULENKAMP ERIC A. |
分类号 |
G02F1/1343;G02F1/1345;G02F1/1362;G02F1/1368;G03F7/40;H01B13/00;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;(IPC1-7):H01L21/44 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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