发明名称 |
Production of a capacitor used in the semiconductor industry comprises mechanically treating the rear side of a semiconductor die to remove a section of substrate, fixing the die to a mounting device, and chemically treating the die |
摘要 |
Production of a capacitor comprises mechanically treating the rear side (50) of a semiconductor die to remove a first section (31) of substrate (30); fixing the treated die to a mounting device; and chemically treating the die to remove a second section (32) of substrate and expose a capacitor with deep trenches. An Independent claim is also included for a process for investigating the structure of a capacitor. Preferred Features: The first section of substrate is a layer having a thickness of 20-100, preferably 60 mu m. The mechanical treatment is carried out by polishing for 30 minutes. The die is fixed to the mounting device using an epoxy resin adhesive.
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申请公布号 |
DE10050049(A1) |
申请公布日期 |
2002.04.25 |
申请号 |
DE20001050049 |
申请日期 |
2000.10.10 |
申请人 |
PROMOS TECHNOLOGIES, INC.;MOSEL VITELIC INC., HSINCHU;INFINEON TECHNOLOGIES AG |
发明人 |
LEE, THING-JONG |
分类号 |
G01N1/32;H01L21/334;H01L21/8242;(IPC1-7):H01L21/302;H01L21/66;H01L21/824 |
主分类号 |
G01N1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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