发明名称 Production of a capacitor used in the semiconductor industry comprises mechanically treating the rear side of a semiconductor die to remove a section of substrate, fixing the die to a mounting device, and chemically treating the die
摘要 Production of a capacitor comprises mechanically treating the rear side (50) of a semiconductor die to remove a first section (31) of substrate (30); fixing the treated die to a mounting device; and chemically treating the die to remove a second section (32) of substrate and expose a capacitor with deep trenches. An Independent claim is also included for a process for investigating the structure of a capacitor. Preferred Features: The first section of substrate is a layer having a thickness of 20-100, preferably 60 mu m. The mechanical treatment is carried out by polishing for 30 minutes. The die is fixed to the mounting device using an epoxy resin adhesive.
申请公布号 DE10050049(A1) 申请公布日期 2002.04.25
申请号 DE20001050049 申请日期 2000.10.10
申请人 PROMOS TECHNOLOGIES, INC.;MOSEL VITELIC INC., HSINCHU;INFINEON TECHNOLOGIES AG 发明人 LEE, THING-JONG
分类号 G01N1/32;H01L21/334;H01L21/8242;(IPC1-7):H01L21/302;H01L21/66;H01L21/824 主分类号 G01N1/32
代理机构 代理人
主权项
地址
您可能感兴趣的专利