发明名称 Method and device for correcting pattern film on a semiconductor substrate
摘要 In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.
申请公布号 US2002047095(A1) 申请公布日期 2002.04.25
申请号 US20010981712 申请日期 2001.10.19
申请人 NEC CORPORATION 发明人 MORISHIGE YUKIO;OOMIYA MAKOTO
分类号 G02F1/13;C23C16/04;C23C16/44;C23C16/48;G03F1/00;G03F1/08;G03F1/72;G03F7/40;H01L21/027;(IPC1-7):A61N5/00;G21G5/00 主分类号 G02F1/13
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