发明名称 METALLIC UNDERCOATING FOR SOLDER MATERIALS
摘要 A semiconductor substrate has an underbump metallization for solder materials. The semiconductor substrate has applied thereto a titanium layer serving as a diffusion barrier and as a wettable surface for the solder-material bump. The solder-material bump is adapted to be applied directly to said diffusion barrier.
申请公布号 US2002047217(A1) 申请公布日期 2002.04.25
申请号 US19990325494 申请日期 1999.05.28
申请人 ZAKEL ELKE;KALLMAYER CHRISTINE;NAVE JENS 发明人 ZAKEL ELKE;KALLMAYER CHRISTINE;NAVE JENS
分类号 B23K35/00;(IPC1-7):H01L23/48 主分类号 B23K35/00
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