发明名称 Semiconductor photo-detector, semiconductor photodetection device, and production methods thereof
摘要 In a semiconductor photo-detector of the present invention, a first semiconductor layer, a second semiconductor layer having, and a photo-absorption part composed of a photo-absorption layer sandwiched between these layers are disposed on a substrate, at least the photo-absorption layer is formed at a position apart inwardly by a finite length from an end surface of the substrate, an end surface of the second semiconductor layer and the substrate or the end surface of the substrate is provided with a light incident facet angled inwardly as it separates from the surface of the second semiconductor or the surface of the substrate. Further, a groove as a guide of an optical waveguide for guiding incident light is disposed opposing the light incident facet, or the substrate end surface at the light incident facet side is protruded by a finite length from a tip part of the light incident facet, or between the optical waveguide and the semiconductor photo-detector is buried in a solid or liquid, or a main reaching area of incident light refracted at an upper layer of the photo-absorption layer is terminated with a substance having a smaller refractive index than the semiconductor layer of photo-absorption region part, or the light incident facet and its vicinity are buried in an organic substance.
申请公布号 US2002047178(A1) 申请公布日期 2002.04.25
申请号 US20010005705 申请日期 2001.12.04
申请人 发明人 FUKANO HIDEKI
分类号 H01L31/0216;H01L31/0232;H01L31/0352;H01L31/109;(IPC1-7):H01L31/06 主分类号 H01L31/0216
代理机构 代理人
主权项
地址